APS Division of Condensed Matter Physics invited symposium nominations

While I've rotated out of my "member-at-large" spot on the APS DCMP executive committee, I still want to pass this on.  Having helped evaluate invited symposium proposals for the last three years, I can tell you that the March Meeting benefits greatly when there is a rich palette.

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The DCMP invited speaker program at March Meeting 2020 is dependent on the invited sessions that are nominated by DCMP members. All invited speakers that we host must be nominated in advance by a DCMP member.

The deadline to submit a nomination is coming up soon: August 23, 2019.

Please take a moment to submit an invited session nomination.

Notes regarding nominations:

• All nominations must be submitted through ScholarOne by August 23, 2019.
• In ScholarOne, an invited session should be submitted as an "Invited Symposium Nomination".
• An invited session consists of 5 speakers. You may include up to 2 alternate speakers in your nomination, in the event that one of the original 5 does not work out.
• While no invited speakers will be guaranteed placement in the program until after all nominations have been reviewed, please get a tentative confirmation of interest from your nominated speakers. There will be a place in the nomination to indicate this.
• A person cannot give technical invited talks in two consecutive years. A list of people that gave technical invited talks in 2019, and are therefore ineligible for 2020, can be found on this page.
• Nominations of women, members of underrepresented minority groups, and scientists from outside the United States are especially encouraged. 

Be sure to select a DCMP Category in your nomination. DCMP categories are:
07.0 TOPOLOGICAL MATERIALS (DCMP)
09.0 SUPERCONDUCTIVITY (DCMP)
11.0 STRONGLY CORRELATED SYSTEMS, INCLUDING QUANTUM FLUIDS AND SOLIDS (DCMP)
12.0 COMPLEX STRUCTURED MATERIALS, INCLUDING GRAPHENE (DCMP)
13.0 SUPERLATTICES, NANOSTRUCTURES, AND OTHER ARTIFICIALLY STRUCTURED MATERIALS (DCMP)
14.0 SURFACES, INTERFACES, AND THIN FILMS (DCMP)
15.0 METALS AND METALLIC ALLOYS (DCMP)

Thank you for your prompt attention to this matter.

Daniel Arovas, DCMP Chair, and Eva Andrei, DCMP Chair-Elect